Third Molecular Transfer Lithography Patent
Granted in the USA
Patent coverage is extended for novel materials transfer processes, water-soluble functional PVA templates, and applications
Santa Clara, CA, April 4, 2011 - Along with US patents 6,849,558 and 7,345,002, the U.S. patent and trademark office has given notification of allowance for a new patent with claims associated with applications of the the molecular transfer lithography (MxL) processes that utilize PVA (polyvinyl alcohol) high resolution nanostructured soluble templates coated with functional materials. The new patent is issued to Stanford University, of which TDI has licensed the patent portfolio, including all international filings, and additional divisional patents currently pending. The patent offices in China, Korea, Singapore, Japan, and others have also awarded patents associated with the fundamental work on soluble template replication and materials transfer comprising the MxL processes and PVA templates.
