Molecular Transfer Lithography Patent
Accepted in China
Concerning patents licensed to TDI from Stanford University, international patent
coverage
is extended for molecular transfer lithography processes and PVA templates
Santa Clara, CA, September 24, 2008 - With patents granted in the U.S.
including 6,849,558 and 7,345,002 for the molecular transfer lithography (MxL)
processes achieving high resolution nanopatterning with templates that are destroyed as
part of the replication procedure, the China patent office has given notification to
Stanford University that the fundamental broad patent claims have been accepted. From
Stanford, TDI has licensed the patent portfolio associated with the MxL processes and
PVA (polyvinyl alcohol) nanostructured templates, including all international filings, and
additional divisional patents currently pending.
“In extending to China the strong patent position of the seminal work constituting
MxL processing and PVA templates that TDI has obtained through a licensing agreement
with Stanford University, this growing patent portfolio provides protection to all
stakeholders involved in the commercialization of the MxL/PVA technology, including
customers,” stated Charles Schaper, President and CEO of TDI.
