In Japan, Third MxL Patent Accepted

International patent coverage is extended for novel materials transfer processes and water-soluble functional PVA templates

Santa Clara, CA, June 14, 2015 – With patents granted in the U.S. including 6,849,558 and 7,345,002 for the molecular transfer lithography (MxL) processes achieving high resolution nanostructures with soluble templates that are destroyed as part of the materials transfer replication procedure, the Japan patent office has accepted a third patent to Stanford University along with Japan Patent Numbers 4671690 and 5102809. From Stanford, TDI has licensed the patent portfolio associated with the MxL processes and PVA (polyvinyl alcohol) soluble nanostructured functional templates, including all international filings, and additional divisional patents currently pending. The patent offices in China, Korea, Singapore, and others have also awarded patents associated with the fundamental work on soluble template replication and materials transfer comprising the MxL processes and PVA templates. The effective date of the patent is September 17, 2002 and the term is twenty years.