exaGlide 10® (Patents include 6,849,558 and 7,345,002)
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- Designed for MxL processing using PVA templates
- High resolution nanopatterning to 10nm feature size
- Large area patterning, from 25mm to 300mm wide substrates
- Silicon wafer, hard disk, and plastic substrate compliant
- Thermal, UV, and moisture initiated adhesion mechanisms
- High throughput, cost effective, semi-automated system
- Upgradable to double-sided nanopatterning applications
- Semiconductors, display, data storage, energy, optoelectronics
- R&D, prototyping, pilot-scale processing applications
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